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Angermeier, D. and Kuhn, W. S. and Druihle, R. and Ballutaud, D. and Triboulet, R. and Gebhardt, Wolfgang (1997) Initial growth processes in the epitaxy of Ge and GeH4 on oxidized Si substrates. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144 (2). pp. 694-697. ISSN 0013-4651, 1945-7111
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Herritsch, Jan and Luy, Jan-Niclas and Rohlf, Sebastian and Gruber, Manuel and Klein, Benedikt P. and Kallaene, Matthias and Schweyen, Peter and Broering, Martin and Rossnagel, Kai and Tonner, Ralf and Gottfried, J. Michael (2020) Influence of Ring Contraction on the Electronic Structure of Nickel Tetrapyrrole Complexes: Corrole vs Porphyrin. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 9 (6): 061005. ISSN 2162-8769, 2162-8777
Hölzl, Robert and Range, Klaus-Jürgen and Fabry, L. and Huber, D. (1999) Calibrated contamination spiking method for silicon wafers in the 10(10)-10(12) atom/cm(2) range. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146 (6). pp. 2245-2253. ISSN 0013-4651, 1945-7111
J
Jedlinska, Katarzyna and Eidenschink, Johannes and Matysik, Frank-Michael and Bas, Boguslaw (2024) Stamping Platinum Electrodes - Design, Fabrication, and Characterization. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 171 (7): 077502. ISSN 0013-4651, 1945-7111
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Pindl, S. and Biebl, M. and Hammerl, E. and Schäfer, H. and von Philipsborn, Henning (1997) Oxidation enhanced diffusion of boron in silicon-on-insulator substrates. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 144 (11). pp. 4022-4026. ISSN 0013-4651, 1945-7111
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Wittmann, J. and Bergholz, W. and Hoffmann, H. (1999) Elymat measurement of intentionally contaminated and dry etched wafers. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146 (1). pp. 313-320. ISSN 0013-4651, 1945-7111
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Yevenes, C. F. Guajardo and Wongkaew, N. and Ngamchana, S. and Surareungchai, W. (2022) Exploring Interdigitated Electrode Arrays Screen-Printed on Paper Substrates for Steady-State Electrochemical Measurements. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 169 (10): 103502. ISSN 0013-4651, 1945-7111
