Ronning, C. and Buettner, M. and Vetter, U. and Feldermann, H. and Wondratschek, O. and Hofsaess, H. and Brunner, W. and Au, F. C. K. and Li, Q. and Lee, S. T. (2001) Ion beam deposition of fluorinated amorphous carbon. JOURNAL OF APPLIED PHYSICS, 90 (8). pp. 4237-4245. ISSN 0021-8979, 1089-7550
Full text not available from this repository. (Request a copy)Abstract
We have studied the growth and the properties of (t)a-C:F films prepared by the deposition of mass separated C-12(+) and F-19(+) ions as a function of the F concentration. The films are always strongly F deficient due to the formation of volatile F-2 and CFx molecules during the deposition process. A maximum F content of about 25 at. % is obtained for an ion charge ratio of C+:F+ = 1:1. The observed mechanical, optical, electrical, and structural properties as well as the thermal stability of the films are strongly influenced by the F content. A three step progression of the film structure is evident for increasing F concentration: the amorphous three-dimensional network of tetrahedrally bonded carbon atoms of pure carbon films (ta-C) with diamondlike properties is doped for very low F concentrations (ta-C:F). A further increase of the F content results first in transformation to a graphitelike amorphous structure (a-C:F) before the deposited films become porous and to a polymerlike one for the highest F content. (C) 2001 American Institute of Physics.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | LOW-DIELECTRIC-CONSTANT; DIAMOND-LIKE-CARBON; CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; INTERLAYER DIELECTRICS; THERMAL-STABILITY; HYDROGEN DILUTION; GLOW-DISCHARGE; RAMAN-SPECTRA; TA-C; |
| Subjects: | 500 Science > 530 Physics |
| Divisions: | Physics > Institute of Experimental and Applied Physics |
| Depositing User: | Dr. Gernot Deinzer |
| Date Deposited: | 06 Dec 2021 07:04 |
| Last Modified: | 06 Dec 2021 07:04 |
| URI: | https://pred.uni-regensburg.de/id/eprint/41033 |
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