Oberhuber, Florian and Blien, Stefan and Schupp, Felix and Weiss, Dieter and Eroms, Jonathan (2017) Anisotropic etching of graphene in inert and oxygen atmospheres. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 214 (2): 1600459. ISSN 1862-6300, 1862-6319
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We study the selective preparation of graphene zigzag edges by crystallographically anisotropic etching processes. Exfoliated graphene on a set of substrates is heated at various temperatures in argon atmospheres with different oxygen concentrations in the ppm range. The removal of carbon atoms from armchair sites at predefined antidots is studied by scanning electron and force microscopy. The anisotropy of etching is determined by the choice of the substrate, graphene's layer thickness and sample conditioning. We show that under all experimental conditions, gaseous oxygen at low concentrations is responsible for graphene etching. SEM image of anisotropically etched antidots in graphene and dependence of etch rate on added oxygen concentration.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | SCANNING-TUNNELING-MICROSCOPY; LAYER GRAPHITE OXIDATION; ZIGZAG EDGES; ELECTRON-MICROSCOPY; ARMCHAIR EDGES; NANORIBBONS; HYDROGEN; REACTIVITY; MECHANISM; anisotropy; antidots; etching; graphene; inert atmosphere; oxygen; zigzag edges |
| Subjects: | 500 Science > 530 Physics |
| Divisions: | Physics > Institute of Experimental and Applied Physics > Chair Professor Weiss > Group Dieter Weiss |
| Depositing User: | Dr. Gernot Deinzer |
| Date Deposited: | 14 Dec 2018 13:01 |
| Last Modified: | 11 Feb 2019 12:39 |
| URI: | https://pred.uni-regensburg.de/id/eprint/452 |
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