Spatial structure of impact-ionization-induced current filaments in n-GaAs films

Gaa, M. and Kunz, R. E. and Schöll, E. and Eberle, W. and Hirschinger, J. and Prettl, Wilhelm (1996) Spatial structure of impact-ionization-induced current filaments in n-GaAs films. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 11 (11). pp. 1646-1655. ISSN 0268-1242, 1361-6641

Full text not available from this repository.

Abstract

We present theoretical and experimental investigations of current; filaments in thin n-GaAs films in the regime of low-temperature impurity breakdown. Simulations combining a Monte Carlo approach for the scattering and generation-recombination processes with a drift-diffusion model on a two-dimensional spatial domain yield detailed information about the distribution of the electron densities, electron temperature, current density and electric field. The theory is confirmed by spatially resolved measurements using a novel technique of quenched photoluminescence.

Item Type: Article
Uncontrolled Keywords: BREATHING CURRENT FILAMENTS; MONTE-CARLO SIMULATION; DELTA-DOPED GAAS; IMPURITY-BREAKDOWN; NONLINEAR DYNAMICS; ELECTRIC-FIELD; MAGNETIC-FIELD; SEMICONDUCTORS; EXCITONS; LAYERS
Subjects: 500 Science > 530 Physics
Divisions: Physics > Institute of Experimental and Applied Physics > Alumni or Retired Professors > Group Wilhelm Prettl
Depositing User: Dr. Gernot Deinzer
Date Deposited: 21 Jun 2023 10:02
Last Modified: 21 Jun 2023 10:02
URI: https://pred.uni-regensburg.de/id/eprint/51402

Actions (login required)

View Item View Item