In situ preparation of epitaxial TlBa2Ca2Cu3O9 high-T-c thin films

Reschauer, N. and Spreitzer, U. and Brozio, W. and Piehler, A. and Renk, Karl F. and Berger, R. and Saemann-Ischenko, G. (1996) In situ preparation of epitaxial TlBa2Ca2Cu3O9 high-T-c thin films. APPLIED PHYSICS LETTERS, 68 (7). pp. 1000-1002. ISSN 0003-6951, 1077-3118

Full text not available from this repository.

Abstract

We report an in situ growth of epitaxial TlBa2Ca2Cu3O9 high-T-c thin films. The films (thickness 80-400 nm) were prepared on LaAlO3 (100) substrates by laser ablation from a thallium-free BaCaCuO target in the presence of Tl2O vapor. X-ray diffraction patterns of theta-2 theta scans showed that the films consisted of highly oriented TlBa2Ca2Cu3O9 with the c axis perpendicular to the substrate surface, and phi scan measurements indicated epitaxial growth. Scanning electron microscope and atomic force microscope investigations showed smooth surfaces without platelike structures. The films had transition temperatures near 100 K. (C) 1996 American Institute of Physics.

Item Type: Article
Uncontrolled Keywords: CRITICAL CURRENTS; FIELDS
Subjects: 500 Science > 530 Physics
Divisions: Physics > Institute of Experimental and Applied Physics > Alumni or Retired Professors > Group Karl F. Renk
Depositing User: Dr. Gernot Deinzer
Date Deposited: 14 Nov 2023 07:18
Last Modified: 14 Nov 2023 07:18
URI: https://pred.uni-regensburg.de/id/eprint/51941

Actions (login required)

View Item View Item