NEUREITHER, B and BASA, C and SANDWICK, T and BLUMENSTOCK, K (1993) BORON-NITRIDE AND SILICON BORON-NITRIDE FILM AND POLISH CHARACTERIZATION. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 140 (12). pp. 3607-3611. ISSN 0013-4651,
Full text not available from this repository.Abstract
A (silicon) boron nitride deposition process based on diborane and ammonia chemistry has been developed. Stable (silicon) boron nitride films have been obtained and the film properties were characterized. The mechanical resistance of boron nitride films against abrasives is utilized for stop layer applications for chemical mechanical polishing. The effectiveness of stop layers can be enhanced by end point detection systems. Two different systems will be discussed.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | ; |
| Depositing User: | Dr. Gernot Deinzer |
| Last Modified: | 19 Oct 2022 08:42 |
| URI: | https://pred.uni-regensburg.de/id/eprint/53656 |
Actions (login required)
 |
View Item |
