MANDL, M and ZWECK, J and HOFFMANN, H (1992) METHOD FOR DETECTION OF THERMALLY ACTIVATED ELEMENT MIGRATION INSIDE MULTILAYER METALLIZATIONS BY MEANS OF ELECTRON-MICROSCOPY. ULTRAMICROSCOPY, 45 (3-4). pp. 351-356. ISSN 0304-3991,
Full text not available from this repository.Abstract
A method is presented to determine the kinetics of elemental migration during thermal treatment in multilayer systems by means of analytical electron microscopy. It is based on the analysis of X-ray spectra excited in the electron diffusion cloud produced by relatively low-energy electrons (10-20 keV) in the sample. The method is verified by means of Monte Carlo simulations of electron spreading and X-ray excitation. It was applied to multilayer metallizations to investigate the failure mechanisms of diffusion barrier layers. The results are described.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | DIFFUSION; |
| Depositing User: | Dr. Gernot Deinzer |
| Last Modified: | 19 Oct 2022 08:44 |
| URI: | https://pred.uni-regensburg.de/id/eprint/54324 |
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