Three-dimensional topological insulator based on a strained HgTe film

Kozlov, D. A. and Kvon, Z. D. and Savchenko, M. L. and Weiss, D. and Mikhailov, N. N. and Dvoretskii, S. A. (2015) Three-dimensional topological insulator based on a strained HgTe film. LOW TEMPERATURE PHYSICS, 41 (2). pp. 82-89. ISSN 1063-777X, 1090-6517

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Abstract

We investigated electron and hole transport in a three-dimensional topological insulator based on a high-mobility (up to 4 x 10(5) cm(2)/V.s) 80-nm-thick strained mercury telluride film. The presence of the gate electrode made it possible to shift the position of the Fermi energy from the valence band through the bulk gap to the conduction band. Specific features observed in classical and quantum transport allowed us to disentangle the contributions to the conductivity by bulk holes, bulk electrons, and the Dirac electrons on the surfaces of the film. (C) 2015 AIP Publishing LLC.

Item Type: Article
Uncontrolled Keywords: QUANTUM-WELLS; SURFACE; PHASE;
Subjects: 500 Science > 530 Physics
Divisions: Physics > Institute of Experimental and Applied Physics > Chair Professor Weiss > Group Dieter Weiss
Depositing User: Dr. Gernot Deinzer
Date Deposited: 24 Jul 2019 13:13
Last Modified: 24 Jul 2019 13:13
URI: https://pred.uni-regensburg.de/id/eprint/6002

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